On December 7, LI Shuzhou and HUO Fengwei, who are from Nanyang Technological University (NTU) paid a visit to Changchun Institute of Applied Chemistry (CIAC) at the invitation of AN Lijia, Director of CIAC and professor of the State Key Laboratory of Polymer Physics and Chemistry.

 

 

The two scholars delivered two lectures, entitled “Modeling Plasmon Enhancement Effects for Metallic Nanostructures” and “Massively Parallel Nanothography” respectively during their visit. In his lecture, LI reported that they have systematically studied extinction spectra and enhancement factors for metallic nanoparticle monomers and dimers composed of spheres, rods and triangular prisms, and they found that the enhancement of electric fields strongly depends on orientations and gap distances for silver dimers. Huo elaborated on the new scanning probe based lithography strategy—polymer pen lithography (PPL).

LI Shuzhou graduated from Nankai University in 1997, and received his M.A. degree from Peking University in 2000. In 2006, he received the Ph.D. degree from University of Wisconsin. Currently, his research focuses on three directions: three-dimensional photonic metamaterials at optical frequencies, high sensitivity substrates for surface enhanced Raman scattering and fluorescence, and light harvesting in solar cells and water splitting.

HUO Fengwei received the B.S. and M.S. degree from Jilin University in 1999 and 2002. After getting his Ph.D. degree from Northwestern University, USA, in 2009, HUO conducted postdoctoral research in Northwestern University for half a year. His research interests include nanolithography and bionanomaterials.